Realization of geometrically apodized phase masks for the production of apodized fiber gratings by UV exposure

X. Liu; J.S. Aitchison; R.M. De La Rue; R.M. De La Rue; J.A.R. Williams; J.A.R. Williams; L.A. Everall; L.A. Everall; I. Bennion; I. Bennion

Conference on Lasers and Electro-Optics
(Optica Publishing Group, 1998),
paper CFE3

Realization of geometrically apodized phase masks for the production of apodized fiber gratings by UV exposure

X. Liu, J.S. Aitchison, R.M. De La Rue, J.A.R. Williams, L.A. Everall, and I. Bennion

Conference on Lasers and Electro-Optics 1998

San Francisco, California United States
3–8 May 1998
ISBN: 1-55752-540-4

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Fiber Gratings (CFE)

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X. Liu, J. S. Aitchison, R. M. De La Rue, J. A. R. Williams, L. A. Everall, and I. Bennion, "Realization of geometrically apodized phase masks for the production of apodized fiber gratings by UV exposure," in Conference on Lasers and Electro-Optics, D. Scifres and A. Weiner, eds., (Optica Publishing Group, 1998), paper CFE3.

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Abstract

As the field of optical communications advances, more complex filters are required for functions such as gain flattening and sidelobe suppression.

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