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Conferences > CLEO > 2007 > CThW > CThW2
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • OSA Technical Digest Series (CD) (Optica Publishing Group, 2007),
  • paper CThW2

Enhanced Aspect Ratio of Focused Ion Beam Nanopatterning Technique in Semiconductors

Alex Hayat, Alex Lahav, and Meir Orenstein

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Abstract

We demonstrate a more than 10 aspect-ratio FIB semiconductor nanopatterningtechnique. The undesired semiconductor material decomposition by the beam-tailions is prevented by a protective Ti layer acting as a mask for the semiconductor.

© 2007 Optical Society of America

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