Abstract

Femtosecond (fs) laser microfabrication has become an important emerging technology in photonics [1]. Several exciting applications have been recently reported such as low loss waveguides, gratings, couplers, microchip lasers etc (see e.g. [2]). In this paper, we present the results of numerical modelling of energy deposition for typical regimes of femtosecond inscription by fundamental harmonic of an Ytterbium-doped laser at 1030 nm and its second harmonic at 515 nm. Laser wavelength is an important operation parameter since shorter wavelength usually allows for finer resolution of the inscription process. We have used a numerical model described in [3, 4]. It comprises an extended Non-Linear Schröedinger Equation (NLSE) coupled to a electron-hole particle balance equation for plasma. This model accounts for the effects of diffraction, dispersion, Kerr nonlinearity, multi-photon absorption, plasma absorption and defocusing.

© 2011 Optical Society of America