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Conferences > FiO > 2015 > FTh3F > FTh3F.3

Atomic-layer lithography of sub-10-nm plasmonic nanogaps on flat metallic surface

Dengxin Ji, Borui Chen, Xie Zeng, Tania Moein, Haomin Song, Nan Zhang, Qiaoqiang Gan, and Alexander Cartwright

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Abstract

We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.

© 2015 Optical Society of America

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