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Conferences > FiO > 2015 > FW3A > FW3A.2

Lithography-free visible metasurface absorbers with tunable dielectric spacers

Kai Liu, Nan Zhang, Dengxin Ji, Haomin Song, Xie Zeng, and Qiaoqiang Gan

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Abstract

We differentiate the spacer-dependent peak shift in coupled and decoupled super absorbing metasurfaces based on magnetic resonance and interference mechanism, respectively, which was experimentally validated by low-cost structures fabricated by lithography-free processes.

© 2015 Optical Society of America

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