Overcoming Rayleigh Limit in Optical Lithography

M. Suhail Zubairy

doi:10.1364/LAOP.2014.LM1B.3

Latin America Optics and Photonics Conference
OSA Technical Digest (online) (Optica Publishing Group, 2014),
paper LM1B.3
•https://doi.org/10.1364/LAOP.2014.LM1B.3

Overcoming Rayleigh Limit in Optical Lithography

M. Suhail Zubairy

Latin America Optics and Photonics Conference 2014

Cancun Mexico
16–21 November 2014
ISBN: 978-1-55752-825-4

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Quantum and Nano Optics, Photonics and Electronics 1 (LM1B)

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M. S. Zubairy, "Overcoming Rayleigh Limit in Optical Lithography," in Latin America Optics and Photonics Conference, OSA Technical Digest (online) (Optica Publishing Group, 2014), paper LM1B.3.

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Abstract

We shall discuss methods to overcome the Rayleigh limit in optical lithography. Our proposed methods are all based on classical light interaction with suitable photoresists.

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