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  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • OSA Technical Digest (CD) (Optica Publishing Group, 2008),
  • paper QTuG1

Resonantly Enhanced Near-Field Lithography

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Abstract

We propose the combination of a planar optical resonator and a solid immersion lens for resonantly enhanced non-contact near-field lithography. Subwavelength small spots can be produced by exciting the Bessel modes of the resonator.

© 2008 Optical Society of America

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