Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Damage resistance of B4C reflective mirror irradiated by X-ray free-electron laser

Not Accessible

Your library or personal account may give you access

Abstract

In this paper, a simple theoretical model combining Monte Carlo simulation with the enthalpy method is provided to simulate the damage resistance of B4C/Si-sub mirror under X-ray free-electron laser irradiation. Two different damage mechanisms are found, dependent on the photon energy. The optimum B4C film thickness is determined by studying the dependence of the damage resistance on the film thickness. Based on the optimized film thickness, the damage thresholds are simulated at photon energy of 0.4–25 keV and a grazing incidence angle of 2 mrad. It is recommended that the energy range around the Si K-edge should be avoided for safety reasons.

© 2023 Chinese Laser Press

PDF Article
More Like This
Damage threshold of platinum/carbon multilayers under hard X-ray free-electron laser irradiation

Jangwoo Kim, Ayaka Nagahira, Takahisa Koyama, Satoshi Matsuyama, Yasuhisa Sano, Makina Yabashi, Haruhiko Ohashi, Tetsuya Ishikawa, and Kazuto Yamauchi
Opt. Express 23(22) 29032-29037 (2015)

Bilayer and trilayer X-ray mirror coatings containing W, Pt, or Ir, in combination with C, C/Co, B4C, or B4C/Ni: X-ray reflectance, film stress, and temporal stability

David L. Windt, Raymond P. Conley, Eric M. Gullikson, Christian Gollwitzer, Michael Krumrey, and Christian Laubis
Appl. Opt. 62(36) 9568-9576 (2023)

Soft x-ray free-electron laser induced damage to inorganic scintillators

Tomáš Burian, Věra Hájková, Jaromír Chalupský, Luděk Vyšín, Pavel Boháček, Martin Přeček, Jan Wild, Cigdem Özkan, Nicola Coppola, Shafagh Dastjani Farahani, Joachim Schulz, Harald Sinn, Thomas Tschentscher, Jérôme Gaudin, Saša Bajt, Kai Tiedtke, Sven Toleikis, Henry N. Chapman, Rolf A. Loch, Marek Jurek, Ryszard Sobierajski, Jacek Krzywinski, Stefan Moeller, Marion Harmand, Germano Galasso, Mitsuru Nagasono, Karel Saskl, Pavol Sovák, and Libor Juha
Opt. Mater. Express 5(2) 254-264 (2015)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved