Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Dual-wavelength DFB Fiber Laser Based on Equivalent Phase Shift and Double Exposure Method

Not Accessible

Your library or personal account may give you access

Abstract

A special sampling structure based on the double exposure technology is proposed to achieve dual-wavelength lasing in the distributed feedback (DFB) fiber laser. This structure is composed of two grating pitches in one sampling period, which could be realized by changing the fiber’s length in the fabrication. And through employing an equivalent phase shift, only a submicrometer-level precision is required for precise phase control. Then a stable dual-wavelength laser with the spacing of 400pm is obtained in the experiment successfully. The output power is 30.46uW and the SMSR is 46dB under a pumped power of 146mw.

© 2010 Optical Society of America

PDF Article
More Like This
Dual-wavelength DFB Laser Based on Four Phase-shifts Sections and Equivalent Chirp Technology for Millimeter-wave Generation

Bocheng Yuan, Yizhe Fan, Simeng Zhu, Yunshan Zhang, John H. Marsh, and Lianping Hou
cb_p_1 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2023

Experimental Demonstration of the Corrugation Pitch Modulated DFB semiconductor Laser Based On the Reconstruction-Equivalent-Chirp Technology

Simin Li, Yuechun Shi, Rong Gu, and Xiangfei Chen
798704 Asia Communications and Photonics Conference and Exhibition (ACP) 2010

Dual-Electrode Tunable Asymmetric π Equivalent Phase Shift SBG Semiconductor Laser

Yating Zhou, Jie Hou, and Xiangfei Chen
AF4A.5 Asia Communications and Photonics Conference (ACP) 2012

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved