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  • Asia Optical Fiber Communication and Optoelectronic Exposition and Conference
  • OSA Technical Digest (CD) (Optica Publishing Group, 2008),
  • paper SuC5
  • https://doi.org/10.1364/AOE.2008.SuC5

Fabrication of optofluidic systems using isotropic wet etched masters in <111> silicon wafer

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Abstract

Low roughness relief structures have been fabricated using wet etching in <111> silicon wafer for use as masters for microfluidic systems. The etch rate is about 1 to 3 mm/min. A surface roughness of about 2 nm was measured by the atomic force microscope (AFM). No distortion or variation on the channel width is observed in the circular and Y-branched relief structures.

© 2008 Optical Society of America

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