Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Thickness Dependence of Electrical and Optical Properties of Indium Tin Oxide Film Deposited by Radio Frequency Magnetron Sputtering

Not Accessible

Your library or personal account may give you access

Abstract

Hall, X-ray diffraction and transmission measurements revealed that the carrier concentration and mobility of indium tin oxide film increased due to its microstructure evolution while its thickness enlarged. Burstein-Moss effect led to its bandgap extension.

© 2013 Optical Society of America

PDF Article
More Like This
Electrical and optical properties of indium tin oxide thin films deposited with plasma ion-assistance

S. Laux, N. Kaiser, A. Zöller, R. Götzelmann, H. Lauth, and H. Bernitzki
TuC.2 Optical Interference Coatings (OIC) 1998

FTO films deposited in transition and oxide modes by magnetron sputtering using Sn metal target

Bo-Huei Liao, Shih-Hao Chan, Cheng-Chung Lee, Sheng-Hui Chen, and Donyau Chiang
WC.7 Optical Interference Coatings (OIC) 2013

Properties of Cu doped Cd1-xZnxTe Films Deposited by Magnetron Sputtering

Xuemei Wang, Lili Wu, Zhe Zhu, Wenwu Wang, Jingquan Zhang, Wei Li, and Lianghuan Feng
ASa3A.40 Advanced Optoelectronics for Energy and Environment (AOEE) 2013

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.