Two-beam two-photon lithography for nanophotonics

Min Gu

doi:10.1364/ASSL.2015.AF2A.3

Advanced Solid State Lasers
OSA Technical Digest (online) (Optica Publishing Group, 2015),
paper AF2A.3
•https://doi.org/10.1364/ASSL.2015.AF2A.3

Two-beam two-photon lithography for nanophotonics

Min Gu

Advanced Solid State Lasers 2015

Berlin Germany
4–9 October 2015
ISBN: 978-1-943580-02-6

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Advanced ps, fs and MIR processing (AF2A)

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M. Gu, "Two-beam two-photon lithography for nanophotonics," in Advanced Solid State Lasers, OSA Technical Digest (online) (Optica Publishing Group, 2015), paper AF2A.3.

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Abstract

We show our recent progress on two-beam two-photon lithography in polymerization and metal-polymer hybrid materials. The application of this super-resolution direct laser writing method in optical big data storage and biomimetic nanophotonic devices are presented.

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