Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Nano particle production by laser ablation and metal sputtering on Si-Wafer substrate

Not Accessible

Your library or personal account may give you access

Abstract

This research relates to methods of deposition and patterning a surface with nano sputtered particles by Laser. The method is mask-less and without vacuum requirement which can be used in wire bonding and microelectronics devices.

© 2015 Optical Society of America

PDF Article
More Like This
Adhesion mechanism between laser sputtered Aluminum nano particles on Si-Wafer by Nd:YAG laser

M. H. Azhdast, H.J. Eichler, K.-D. Lang, and V. Glaw
ATh1K.7 CLEO: Applications and Technology (CLEO:A&T) 2016

Comparison of nano particle implantation with picosecond lasers by concerning different wavelengths from Aluminum and Copper on Silicon wafer substrate

M. H. Azhdast, M. Kossatz, H. J. Eichler, K.-D. Lang, and V. Glaw
ATu4C.2 CLEO: Applications and Technology (CLEO:A&T) 2017

Room temperature CW operation of 1.3um quantum dot lasers on a Si substrate by Pd-mediated wafer bonding

Zihao Wang, Stefan Preble, Chi-sen Lee, and Wei Guo
IM4B.4 Integrated Photonics Research, Silicon and Nanophotonics (IPR) 2015

Poster Presentation

Media 1: PDF (1290 KB)     
Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.