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Fabrication of broadband antireflection microstructures on ZnSe single crystal for mid-IR applications

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Abstract

We report the method of microstructure fabrication on ZnSe single crystal surface for reflectivity reduction in a wide spectral range of 3.8 to 14 µm by using dry etching in CH3 ion plasma through a TiO2-mask fabricated by a femtosecond laser ablation.

© 2018 The Author(s)

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