Two-photon Lithography of Cloaked Fluorescent Microstructures for Anti-counterfeiting Applications

Arun Jaiswal; Sweta Rani; Sweta Rani; Gaurav Pratap Singh; Sumit Saxena; Sumit Saxena; Shobha Shukla; Shobha Shukla

doi:10.1364/ASSL.2021.JTu1A.49

Laser Congress 2021 (ASSL,LAC)
(Optica Publishing Group, 2021),
paper JTu1A.49
•https://doi.org/10.1364/ASSL.2021.JTu1A.49

Two-photon Lithography of Cloaked Fluorescent Microstructures for Anti-counterfeiting Applications

Arun Jaiswal, Sweta Rani, Gaurav Pratap Singh, Sumit Saxena, and Shobha Shukla

Advanced Solid State Lasers 2021

Washington, DC United States
3–7 October 2021
ISBN: 978-1-55752-347-1

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Poster Session II (JTu1A)

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A. Jaiswal, S. Rani, G. P. Singh, S. Saxena, and S. Shukla, "Two-photon Lithography of Cloaked Fluorescent Microstructures for Anti-counterfeiting Applications," in Laser Congress 2021 (ASSL,LAC), (Optica Publishing Group, 2021), paper JTu1A.49.

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Abstract

Two-photon polymerization assisted fabrication of fluorescene encoded, cloaked nanopatterned labels, embedded in non emissive polymer bed has been demonstrated for anti-counterfeiting application.

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