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Conferences > ASSP > 2003 > UVBS > 380

CW 198.5-nm light generation in CLBO

Shinichi Imai, Hiromu Inoue, Takehiko Nomura, and Toru Tojo

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Abstract

A continuous-wave 198.5-nm light is produced by sum-frequency generation in CLBO for advanced photolithography mask inspections. Two fundamental lights are frequency-stabilized and mixed in an external cavity. The output power of 50 mW was demonstrated with a single-resonance cavity.

© 2003 Optical Society of America

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