Enormous photon-induced volume expansion of Ge-doped silica thin films

Junji Nishii; Hideo Hosono

doi:10.1364/BGPP.1999.CB1

Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides
OSA Trends in Optics and Photonics Series (Optica Publishing Group, 1999),
paper CB1
•https://doi.org/10.1364/BGPP.1999.CB1

Enormous photon-induced volume expansion of Ge-doped silica thin films

Junji Nishii and Hideo Hosono

Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides 1999

Stuart, Florida United States
ISBN: 1-55752-593-5

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Photosensitivity Effects in Waveguides (CB)

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J. Nishii and H. Hosono, "Enormous photon-induced volume expansion of Ge-doped silica thin films," in Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides, T. Erdogan, E. Friebele, and R. Kashyap, eds., Vol. 33 of OSA Trends in Optics and Photonics Series (Optica Publishing Group, 1999), paper CB1.

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Abstract

Photon induced positive refractive index change of Ge-doped SiO₂ glasses allows the fabrication of the fiber Bragg gratings, which is applicable to optical fiber communication systems as a spectrally selective filters.

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