Abstract
A major growing application for fused silica is as microlithography lenses for integrated circuit manufacture using deep ultraviolet excimer laser radiation at 248 nm (KrF) and 193 nm (ArF) wavelengths. Such short wavelength radiation, while allowing higher image resolution, can cause structural changes in the glass which can adversely affect lens performance. These changes are manifest as color centers and glass densification.
© 1997 Optical Society of America
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