Studies of the XeCl laser system at excitation rates of 0.4-5.0 MW/cm3

Gary G. Tisone; James M. Hoffman; James B. Moreno

doi:10.1364/CLEO.1981.THB3

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1981),
paper THB3
•https://doi.org/10.1364/CLEO.1981.THB3

Studies of the XeCl laser system at excitation rates of 0.4-5.0 MW/cm³

Gary G. Tisone, James M. Hoffman, and James B. Moreno

Conference on Lasers and Electro-Optics 1981

Washington, D.C. United States
10–12 June 1981
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Poster Session: 2 (THB)

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G. G. Tisone, J. M. Hoffman, and J. B. Moreno, "Studies of the XeCl laser system at excitation rates of 0.4-5.0 MW/cm3," in Conference on Lasers and Electro-Optics, F. Abbott, J. Ready, T. Li, and G. Sincerbox, eds., OSA Technical Digest (Optica Publishing Group, 1981), paper THB3.

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Abstract

A program to study extensively the XeCl laser system at high excitation rates has been undertaken. The goal of this program has been to determine the parameters necessary to scale the XeCl laser to large systems and to determine the limitations on the efficiency of the XeCl system. Extensive data have been taken to compare with a computer model that has been developed.

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