Tunable ultrahigh spectral brightness ArF* excimer laser source

H. Egger; T. Srinivasan; K. Hohla; H. Scheingraber; C. R. Vidal; H. Plummer; C. K. Rhodes

doi:10.1364/CLEO.1981.THI3

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1981),
paper THI3
•https://doi.org/10.1364/CLEO.1981.THI3

Tunable ultrahigh spectral brightness ArF* excimer laser source

H. Egger, T. Srinivasan, K. Hohla, H. Scheingraber, C. R. Vidal, H. Plummer, and C. K. Rhodes

Conference on Lasers and Electro-Optics 1981

Washington, D.C. United States
10–12 June 1981
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Rare Gas Halide Lasers (THI)

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H. Egger, T. Srinivasan, K. Hohla, H. Scheingraber, C. R. Vidal, H. Plummer, and C. K. Rhodes, "Tunable ultrahigh spectral brightness ArF* excimer laser source," in Conference on Lasers and Electro-Optics, F. Abbott, J. Ready, T. Li, and G. Sincerbox, eds., OSA Technical Digest (Optica Publishing Group, 1981), paper THI3.

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Abstract

Rare gas halide excimer sources have proved to be powerful and versatile tools in the study of multiphoton processes. In this context the development of excimer laser systems has centered on the extraction of energy in narrow-bandwidth diffraction- limited beams, as this is essential for achieving high spectral brightness.

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