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Microwave- and UHF-pumped rare-gas-halide lasers

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Abstract

The current generation of rare-gas-halide (RGH) lasers has encountered some difficult limits on system lifetime, pulse duration, and pulse repetition rate. Many of these are imposed by the devices used for excitation of the laser gas. The use of rf discharges for pumping of RGH lasers can allow significant progress in several of these problem areas. Electrodeless rf discharges can serve as the basis of laser excitation systems in which no contaminating metal surface is exposed to the reactive gas medium.

© 1982 Optical Society of America

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