Multiply charged ion production with picosecond 193-nm radiation

T. S. Luk; H. Pummer; K. Boyer; M. Shahidi; H. Egger; Charles K. Rhodes

doi:10.1364/CLEO.1983.THL2

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1983),
paper THL2
•https://doi.org/10.1364/CLEO.1983.THL2

Multiply charged ion production with picosecond 193-nm radiation

T. S. Luk, H. Pummer, K. Boyer, M. Shahidi, H. Egger, and Charles K. Rhodes

Conference on Lasers and Electro-Optics 1983

Baltimore, Maryland United States
17–20 May 1983
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Picosecond Sources and Applications (THL)

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T. S. Luk, H. Pummer, K. Boyer, M. Shahidi, H. Egger, and C. K. Rhodes, "Multiply charged ion production with picosecond 193-nm radiation," in Conference on Lasers and Electro-Optics, G. Sincerbox, T. Li, A. Gara, and C. Giuliano, eds., OSA Technical Digest (Optica Publishing Group, 1983), paper THL2.

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Abstract

Recent interest and progress in generating coherent high-intensity VUV and XUV radiation have stimulated interest in studying the production of highly stripped and excited ions by multiphoton processes.

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