Abstract
Ultraviolet laser-induced chemical vapor deposition (CVD) of metals,1,2 semiconductors,3 and insulators4 has been extensively studied in recent years. For large area processing, excimer lasers are the most promising UV light sources because of their high average power (several to 100 W) and excellent beam uniformity. When a typical excimer laser with a short duration pulse (~10 nsec) and high peak intensity (>1 MW/cm2) is used, photoinduced transient surface heating as well as photochemical effects should be responsible for deposition characteristics, such as film morphology. This paper reports experimental results which clarify the importance of photoinduced surface heating effects for obtaining a good quality metallic film in KrF laser (λ = 248 nm)-induced Cr deposition from Cr(CO)6.
© 1984 Optical Society of America
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