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Chemical dynamics of the ablative photodecomposition of polymers by far-ultraviolet (193-nm) laser radiation

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Abstract

The efficiency of ablative photodecomposition of poly(methyl methacrylate), an addition polymer, caused by pulsed radiation at 193 nm from an excimer laser (argon-fluorine fill) has been studied as a function of intensity. A threshold for the onset of the process lies at 10 mJ/cm2/pulse of 14 nsec. The efficiency of the process increases rapidly with intensity up to 250 mJ/cm2/pulse after which it levels off sharply. The etch depth of ~3100 Å/ pulse at 250 mJ/cm2 can be compared with a depth of 4800 Å/pulse at a fluence of >20 J/cm2/pulse. The etching of PMMA at fluences >100 mJ/cm2 is believed to follow a different mechanism from the process at tower fluences.

© 1984 Optical Society of America

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