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LASER PHOTOCHEMICAL (PCVD) AND PHOTOTHERWAL (LCVD) GAS PHASE DEPOSITION OF COPPER

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Abstract

Laser and light induced gas phase deposition processes1 are quite attractive because of their conceptual simplicity–in particular the elimination of lithographic and masking steps. To achieve practical utility, however, the process must produce high quality materials and depending upon the application, certain specific materials. An important material for many applications is copper and we describe here the gas phase laser deposition of this metal.

© 1984 Optical Society of America

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