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High-power subpicosecond KrF laser system

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Abstract

There is interest in the use of high-power UV laser sources in the studies of surface science, nonlinear atomic processes, and the possible multiphoton pumping of an x-ray laser.1 To this end, a subpicosecond KrF* laser system emitting 25 mJ/pulse (~50 GW) at 248 nm has been developed.

© 1986 Optical Society of America

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