Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Reactive Ar-ion laser-assisted etching of molybdenum and tungsten foils in air

Not Accessible

Your library or personal account may give you access

Abstract

Recently a preliminary study of laser-assisted chemical etching of Mo foils in air was reported,1 In the present study, a systematic investigation of this process in Mo as well as in W was carried out. An Ar-ion laser beam was tightly focused on the samples which absorbed ~55% of the incoming radiation. This heated them locally to red hot temperatures, where rapid oxidation and volatilization of the trioxides (MoO3 and WO3) caused the etching.

© 1986 Optical Society of America

PDF Article
More Like This
Laser Photochemical Etching of Molybdenum and Tungsten Thin Films by Surface Halogenation*

M. Rothschild, J. H. C. Sedlacek, and D. J. Ehrlich
MB4 Microphysics of Surfaces, Beams, and Adsorbates (MSBA) 1987

Fine line aluminum etching using a tunable UV laser

Joshua Alspector and Robert Contolini
TUJ5 Conference on Lasers and Electro-Optics (CLEO:S&I) 1986

Experimental study of laser accelerated thin foils

R. V. Serov, V. V. Aleksandrov, S. F. Goncharov, P. P. Pashinin, V. Y. Perov, and V. P. Yanovsky
THL36 International Laser Science Conference (ILS) 1986

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.