Abstract

Even though alloys are used widely for integrated circuit metallization, laser photoiytic depositions ot conductors have focused on pure metals,¹ and, with the exception of Ehrlich's work on Ti–Al deposits,² little attention has been paid to the deposition of alloys. In this experiment we wished to demonstrate the deposition of an alloy by photolysis of a binary mixture of precursors (dimethylzinc and trimethylaluminum) and, in particular, the deposition of an alloy by photolysis of a mixture containing one nominally transparent precursor (trimethylaluminum). Film deposition kinetics were monitored as an initial probe of the alloy deposition mechanism.

© 1986 Optical Society of America