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Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1988),
  • paper CPD17

OH MOLECULB CONCEMTION MEASUREMENTS IN RF DISCHARGE WITH TRANSVERSE GAS FLCW

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Abstract

Wide application of electrical discharge in molecular gas flow resulted in an active study of plasma-chemical processes accompanying such a discharge. To investigate their mechanisms the reliable information on plasma composition including the concentration of chemically active particles and radicals is necessary, The abovesaid particles and radicals concentration is, as a rule, not high, but it may essential in discharge neutral component formation and destruction /1/.

© 1988 Optical Society of America

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