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  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1988),
  • paper TUB3

Scaling of a high-pump-rate 500-J KrF laser

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Abstract

An electron-beam-pumped KrF laser has been developed to explore the pulse power and laser issues associated with scaling the KrF laser to a large-scale ICF driver. As shown in Fig. 1, the 30-× 20- × 100-cm3 active volume is pumped by four electron beams generated in vacuum diodes driven by a 100-ns double parallel water Blumlein pulse forming lines. The electron-beam modules composed of vacuum diodes and PFLs are designed to pile up two-dimensionally to check the scaling of the e-beam aperture. Each diode generates a wide-aperture (20- × 50-cm2), intense (500-kV, 100-kA) electron beam. The velvet cathode allows the vacuum diode to emit a 100-A/cm2 high-current density electron beam at constant impedance after a very short turn-on time, as shown in Fig. 2. The dc magnetic field of 1.3 kG guides the electron beam of near critical current density to inject into the Kr rich gas mixture of 1 atm.

© 1988 Optical Society of America

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