Abstract
Laser-induced chemistry is a widely used technique for studying reactions between atoms and molecules. Recently, the use of lasers to initiate, control, or enhance gas-phase etch reactions at solid surfaces has shown promise as a method for providing highly selective etching and as a technique for producing atomically clean surfaces. The present work concerns the investigation, characterization, and development of laser-induced pattern etching of silicon, silicon dioxide, and silicon nitride, three important materials used in the semiconductor industry.
© 1988 Optical Society of America
PDF ArticleMore Like This
JAMES H. BRANNON
WX1 Conference on Lasers and Electro-Optics (CLEO:S&I) 1988
James H. Brannon
MB3 Microphysics of Surfaces, Beams, and Adsorbates (MSBA) 1987
Carol I. H. Ashby
FG2 International Laser Science Conference (ILS) 1986