Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > CLEO > 1989 > FF > FF1
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1989),
  • paper FF1

Highly conductive and reliable directly written LSI Interconnection by laser processing

SHUNJI KISHIDA and YUKIO MORISHIGE

Open Access Open Access

Abstract

We have produced a novel and practical laser processing scheme for maskless wiring of LSI interconnections, which is expected to have substantial impact on LSI development, it consists of contact-hole formation in a passivation layer by laser ablation and pulsed laser CVD metal line writing. The directly written interconnection allows large current flow (~102 mA) and has low contact resistance (≲1 Ω) and high reliability as proved by accelerated age testing.

© 1989 Optical Society of America

PDF Article
More Like This
Low-resistivity contact formation for a high-current density microdevice intercomnection using laser chemical vapor deposition of tungsten

TSUTOMU SHINZAWA, YUKIO MORISHIGE, FUMIHIKO UESUGI, YOSHIHIRO NAMBU, SHUNJI KISHIDA, and MASAKI HIRATA
WR4 Conference on Lasers and Electro-Optics (CLEO:S&I) 1988

Low contact resistance formation between laser written Mo and underlayered A1 interconnection

TAKASHI KAMIMURA, MIKIO KONGO, KATSKRO MIZUKOSHI, SHUZO SANO, and FUMIKAZU ITOH
CWF59 Conference on Lasers and Electro-Optics (CLEO:S&I) 1990

Thin film transistor using a-Si:H film deposited by laser-induced chemical vapor deposition

Y. HIURA, H. UCHIDA, S. KANEKO, YUKIO MORISHIGE, and SHUNJI KISHIDA
FF2 Conference on Lasers and Electro-Optics (CLEO:S&I) 1989

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use