Laser assisted CVD and MOCVD growth of semiconductor films

J. J. COLEMAN; JAMES G. EDEN

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1989),
paper FN3

Laser assisted CVD and MOCVD growth of semiconductor films

J. J. COLEMAN and JAMES G. EDEN

Conference on Lasers and Electro-Optics 1989

Baltimore, Maryland United States
24–28 April 1989
ISBN: 1-55752-086-0

From the session
Mechanisms and Optical Diagnostics of Laser Processing (FN)

Open Access

Get PDF
Email
Share
Get Citation
Copy Citation Text
J. J. COLEMAN and J. G. EDEN, "Laser assisted CVD and MOCVD growth of semiconductor films," in Conference on Lasers and Electro-Optics, R. Bartolini, P. Liao, J. Bufton, and W. Krupke, eds., Vol. 11 of OSA Technical Digest (Optica Publishing Group, 1989), paper FN3.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Save article

Abstract

The use of photochemistry in the gas phase in the growth of elemental and III–V compound semiconductor films by CVD and MOCVD is a rapidly growing field, and recent experiments involving the laser-assisted growth of GaAs and the demonstration of ammonia as a photosensitizer are described. (Invited paper, 25 min)

PDF Article

More Like This

Surface Photoprocesses in Laser Assisted Etching and Film Growth

F. A. Houle
MA1 Microphysics of Surfaces, Beams, and Adsorbates (MSBA) 1989

Heteroepitaxial Growth of GaAs Films by Alternating Ion Beam Deposition

R. A. Zuhr, T. E. Haynes, S. J. Pennycook, and B. R. Appleton
WC8 Microphysics of Surfaces, Beams, and Adsorbates (MSBA) 1989

Laser assisted metalorganic chemical vapor deposition of zinc selenide

G. B. SHINN, P. M. GILLESPIE, W. B. HAYNES, and W. L. WILSON
TUG5 Conference on Lasers and Electro-Optics (CLEO:S&I) 1989

Previous Article Next Article