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Conferences > CLEO > 1990 > CWH > CWH4
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1990),
  • paper CWH4

Argon-fluoride excimer laser-induced chemical vapor deposition of tungsten-carbon multilayers for x-ray optics

KATSUHIKO MUTOH, YUKA YAMADA, TAKASHI IWABUCHI, and TAKEO MIYATA

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Abstract

Tungsten-carbon (W/C) multilayers for x-ray optics were prepared by argon-fluoride (ArF) excimer laser-induced chemical vapor deposition (LCVD) using tungsten hexafluoride (WF6) and benzene (C6H6) gases. We analyzed the multilayer structure by the small angle x-ray scattering method and also determined the multilayer depth profile by Auger electron spectroscopy (AES).

© 1990 Optical Society of America

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