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Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1991),
  • paper CFF4

Excimer laser photoablation of teflon AF, with the aid of a new doping and dedoping technique

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Abstract

Materials which are transparent to the excimer laser radiation are usually extremely difficult to ablate cleanly. High fluence are needed and ablation is more a damage due to electrical breakdown in the solid. However, coherent multiphoton absorption of a femtosecond pulse and subsequent clean ablation of regular TEFLON was demonstrated.1 Doping of some polymer in order to make it absorbing and sensitive to ablation has been reported in the past few years.2

© 1991 Optical Society of America

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