Abstract
Laser cleaning techniques1–3 demonstrated recently appear to be promising for practical removal of small particulate contaminations from solid surfaces. One focus of our work is on the cleaning of silicon membrane stencil masks that are to be used for e-beam lithography printing of DRAMs of 64 MBit and beyond.4 These masks contain the chip pattern as physical holes in a silicon membrane of thickness 2 μm. The cleaning challenge is to remove particles even out of the stencil holes while not damaging the sensitive membrane.
© 1991 Optical Society of America
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