Abstract

Ablative photodecomposition process (APD) of organic materials using pulsed ultraviolet lasers with sufficient intensity is an important technique for etching, patterning, and surface modification. We have reported that the highly periodic microstructures on polyethersulfone film, produced by XeCl laser ablation, am efficient for alignment of nematic liquid crystals in a display cell.^1,2 In the present study, we report the selective-area electroless plating on polymer surface ablated by excimer lasers. Electroless plating on polymers is an indispensable process for high-density multichip interconnect substrates of copper conductors on polymers.

© 1991 Optical Society of America