Fabrication of high laser damage resistant dielectric coatings produced with an optimized ion-assisted deposition technique

D. G. Golovatch; V. V. Kantcel; V. I. Rakhovsky

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1992),
paper CWH6

Fabrication of high laser damage resistant dielectric coatings produced with an optimized ion-assisted deposition technique

D. G. Golovatch, V. V. Kantcel, and V. I. Rakhovsky

Conference on Lasers and Electro-Optics 1992

Anaheim, California United States
10–15 May 1992
ISBN: 1-55752-537-5

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Semiconductor Microfabrication and Thin Films (CWH)

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D. G. Golovatch, V. V. Kantcel, and V. I. Rakhovsky, "Fabrication of high laser damage resistant dielectric coatings produced with an optimized ion-assisted deposition technique," in Conference on Lasers and Electro-Optics, A. Johnson, R. Lind, T. Baer, and A. Smirl, eds., Vol. 12 of OSA Technical Digest (Optica Publishing Group, 1992), paper CWH6.

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Abstract

Laser-induced damage in optical coatings is a great problem. The damage appears to be caused by some type of optical absorption in the coatings. Absorption of coatings is strictly influenced by columnar microstructure and nodular thin film defects. It is possible to reduce size and concentration of the defects and increase laser-induced damage threshold (LIDT) of thin film coatings using ion-assisted deposition. To optimize deposition parameters we have used a high precision LIDT measurement technique, developed at our laboratory.

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