Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1993),
  • paper CThI2

Ultrahigh brightness, short-pulse excimer laser system at 19З nm

Not Accessible

Your library or personal account may give you access

Abstract

Recent advances in high power, ultrashort pulse ArF excimer laser technology have led to development of ArF laser systems with peak powers in the 2-10 GW range.1-4 This paper reports on thedesign and performance of an ultrahigh-brightness ArF excimer system operating at the 0.1-TW level, based on a discharge pumped preamplifier and an electron-beam pumped power amplifier. For the generation of subpicosecond injection pulses at 193 nm, a spectrally compensated sum-frequency mixing scheme with ß-barium borate (BBO) as a nonlinear crystal is utilized.5

© 1993 Optical Society of America

PDF Article
More Like This
Recent Progress of Terawatt Excimer Laser Sources

F. K. Tittel, K. Mossavi, and G. Szabó
UILS26 Shortwavelength V: Physics with Intense Laser Pulses (HFSW) 1993

Subpicosecond gain characteristics of an ArF-excimer discharge

C. Momma, H. Eichmann, A. Tünnermann, and B. Wellegehausen
QThH42 Quantum Electronics and Laser Science Conference (CLEO:FS) 1993

Ultrahigh brightness XeCI laser system

C. R. TALLMAN, A. J. TAYLOR, J. P. ROBERTS, C. S. LESTER, T. R. GOSNELL, and W. H. LONG
TUJ46 Conference on Lasers and Electro-Optics (CLEO:S&I) 1989

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved