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  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1993),
  • paper CTuH4

High average power, 7-ps KrF laser system for x-ray lithography

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Abstract

Soft x-rays of 1 nm wavelength are a strong contender for the production of 256 Mbit and 1 Gbit DRAM microchips. Compact syncrotrons, generating tens of watts of x-rays per beam into ten beams or more, will constitute the main source for large-scale production of such microchips. Nevertheless, such machines require a relatively large initial investment and occupy extensive factory space. Therefore, smaller, laboratory-size, x-ray sources will be required to generate the power of only one synchrotron beam to be used either by large companies for R&D work or by small companies that cannot afford a synchrotron and have a limited production.

© 1993 Optical Society of America

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