Long gas lifetime discharge excited ArF excimer laser

T. Saito; S. Ito; A. Tada; K. Hotta

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1993),
paper CWJ13

Long gas lifetime discharge excited ArF excimer laser

T. Saito, S. Ito, A. Tada, and K. Hotta

Conference on Lasers and Electro-Optics 1993

Baltimore, Maryland United States
2–7 May 1993
ISBN: 1-55752-189-1

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Poster Session 2 (CWJ)

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T. Saito, S. Ito, A. Tada, and K. Hotta, "Long gas lifetime discharge excited ArF excimer laser," in Conference on Lasers and Electro-Optics, A. Glass, T. Hsu, T. Deutsch, and J. Goldman, eds., Vol. 10 of OSA Technical Digest (Optica Publishing Group, 1993), paper CWJ13.

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Abstract

Achieving extended lifetimes in discharge- excited ArF excimer lasers lias been an important issue for industrial applications. This paper reports that an ArF excimer laser with a new gas purifier, which has a long gas-life-time of more than 1 × 10⁸ shots, was developed.

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