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  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1994),
  • paper CFB3

Scalable Si nanofabrication technology

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Abstract

Development of Si-based optoelectronics has been constrained because of Si's indirect bandgap. Recent observations of efficient room temperature photoluminescence (PL) from porous Si have stimulated a great deal of interest. During the last two years, a substantial literature has attributed porous-Si PL variously to quantum size effects, surface chemistry, or a combination of the two. Due to the nature of porous Si fabrication, i.e., anodic oxidation in an aqueous HF solution, a distribution of crystallite sizes, shapes, orientations and the formation of Si—H bonds is unavoidable. A technique for large area nanoscale fabrication of crystalline Si, therefore, is required for a comprehensive investigation of quantum confinement effects.

© 1994 Optical Society of America

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