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Conferences > CLEO > 1994 > CFB > CFB4
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1994),
  • paper CFB4

Laser ablation for deep etching

A. J. Devasahayam, D. N. Lambeth, T. E. Schlesinger, and D. D. Stancil

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Abstract

Lithium niobate is an important material in the integrated optics area. However, the etch rate is slow with conventional etching techniques. We describe a method using laser ablation to perform deep etches of the order of hundreds of microns. The profiles can be accurately predicted using a super-position model. Electrostatic modeling is done to determine the effect of surface roughness on the electric fields in the substrate.

© 1994 Optical Society of America

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