Abstract

Epitaxial thin films of ferroelectric materials offer broad possibilities for microelectronic applications, including rf phase shifters, nonvolatile memory cells, and varactors. Pulsed laser deposition (PLD) is now a well-established technique for depositing high quality ferroelectric thin films such as BaTiO₃, PbZr_xTi_1-xO₃, Bi₄Ti₃O₁₂, and KTa_xNb_1-xO₃. The current status of the field including film growth mechanisms and microelectronic applications being developed will be presented.

© 1994 Optical Society of America