Two-photon-induced bleaching and damage of an electro-optical side-chain polymer

Myoungsik Cha; William E. Torruellas; George I. Stegeman; Guus R. Mohlmann; Guus R. Mohlmann; Winfried H. G. Horsthuis; Winfried H. G. Horsthuis

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1995),
paper CTuI37

Two-photon-induced bleaching and damage of an electro-optical side-chain polymer

Myoungsik Cha, William E. Torruellas, George I. Stegeman, Guus R. Mohlmann, and Winfried H. G. Horsthuis

Conference on Lasers and Electro-Optics 1995

Baltimore, Maryland United States
21–26 May 1995
ISBN: 1-55752-400-9

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M. Cha, W. E. Torruellas, G. I. Stegeman, G. R. Mohlmann, and W. H. G. Horsthuis, "Two-photon-induced bleaching and damage of an electro-optical side-chain polymer," in Conference on Lasers and Electro-Optics, T. Deutsch, J. Goldsmith, D. Killinger, and G. Valley, eds., Vol. 15 of OSA Technical Digest (Optica Publishing Group, 1995), paper CTuI37.

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Abstract

The stability of electro-optically-active polymers exposed to intense optical irradiations could have tremendous repercussions in the implementation of optically active devices. Indeed, most of these polymers benefit from the fact that they can be easily bleached for optical-pattern formation¹ (waveguides, optical memories). On the other hand, two-photon absorption has been proposed to induce permanent optical changes in bulk matrices doped with organic dyes, for 3D-optical-storage applications.² Here we investigate similar effects induced into a di-amino- nitro-stilbene (DANS) side-chain polymer intended for commercial-waveguide electro-optical applications.³

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