Nonlinear spectroscopy and process monitoring of Si(001) interfaces

M. C. Downer; O. A. Aktsipetrov; M. H. Anderson; M. ter Beek; J. I. Dadap; J. G. Ekerdt; X. F. Hu; Y. Jiang; Y.-S. Lee; D. Lim; J. K. Lowell; E. D. Mishina; N. M. Russell; P. T. Wilson; Z. Xu

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1997),
paper CFG3

Nonlinear spectroscopy and process monitoring of Si(001) interfaces

M. C. Downer, O. A. Aktsipetrov, M. H. Anderson, M. ter Beek, J. I. Dadap, J. G. Ekerdt, X. F. Hu, Y. Jiang, Y.-S. Lee, D. Lim, J. K. Lowell, E. D. Mishina, N. M. Russell, P. T. Wilson, and Z. Xu

Conference on Lasers and Electro-Optics 1997

Baltimore, Maryland United States
18–23 May 1997
ISBN: 1-55752-498-8

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Nonlinear Measurements for Material Characterization (CFG)

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M. C. Downer, O. A. Aktsipetrov, M. H. Anderson, M. ter Beek, J. I. Dadap, J. G. Ekerdt, X. F. Hu, Y. Jiang, Y. -. Lee, D. Lim, J. K. Lowell, E. D. Mishina, N. M. Russell, P. T. Wilson, and Z. Xu, "Nonlinear spectroscopy and process monitoring of Si(001) interfaces," in Conference on Lasers and Electro-Optics, D. Killinger, G. Valley, C. Chang-Hasnain, and W. Knox, eds., Vol. 11 of OSA Technical Digest (Optica Publishing Group, 1997), paper CFG3.

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Abstract

Si(001) interfaces are among the most technologically important for nonlinear optical analysis, yet their exceptionally weak interfacial second harmonic susceptibility χ(2)s has strongly inhibited quantitative second harmonic (SHJ spectroscopy and related nonlinear optical process monitoring applications.

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