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All-solid-state 213 nm laser is a potential light source for the next generation microlithography, mainly because 213 nm is short enough to produce a 0.18-µm feature and, so far as optical damage is concerned, it is a better wavelength than 193 nm for materials such as fused silica, which is predominantly used for the microlithography system.
© 1997 Optical Society of America
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