Multiplexed diode-laser sensor system for vapor-phase semiconductor wafer cleaning process monitoring

Shang-I Chou; Douglas S. Baer; Ronald K. Hanson

Conference on Lasers and Electro-Optics
(Optica Publishing Group, 1998),
paper CThI5

Multiplexed diode-laser sensor system for vapor-phase semiconductor wafer cleaning process monitoring

Shang-I Chou, Douglas S. Baer, and Ronald K. Hanson

Conference on Lasers and Electro-Optics 1998

San Francisco, California United States
3–8 May 1998
ISBN: 1-55752-540-4

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Laser-based Materials Diagnostics (CThI)

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S. Chou, D. S. Baer, and R. K. Hanson, "Multiplexed diode-laser sensor system for vapor-phase semiconductor wafer cleaning process monitoring," in Conference on Lasers and Electro-Optics, D. Scifres and A. Weiner, eds., (Optica Publishing Group, 1998), paper CThI5.

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Abstract

Vapor-phase wafer cleaning processes offer the potential to decrease chemical usage and water consumption significantly over current liquid cleaning methods.

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