Abstract
Plasma-enhanced chemical vapor deposition (PECVD) has shown promise since the late 1980s1 as a technique for growing germano-silica waveguide layers for use in photonic integrated circuits.
© 1998 Optical Society of America
PDF ArticleMore Like This
M. V. Bazylenko and D. Moss
JMF.7 Bragg Gratings, Photosensitivity, and Poling in Glass Fibers and Waveguides (BGPP) 1997
M. V. Bazylenko, M. Gross, P.L. Chu, and D. Moss
SuB.5 Photosensitivity and Quadratic Nonlinearity in Glass Waveguides (PQN) 1995
Ali Saliminia, Alain Villeneuve, Tigran V. Galstyan, Sophie Larochelle, and Kathleen Richardson
CWF63 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 1998