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Conferences > CLEO > 1998 > LTuB > LTuB1
  • Conference on Lasers and Electro-Optics
  • (Optica Publishing Group, 1998),
  • paper LTuB1

Photolithography at wavelengths below 200 nm

M. Rothschild

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Abstract

The mainstream patterning technology in microelectronics has been projection photolithography.

© 1998 Optical Society of America

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